Saturday, May 4, 2024
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Lam Research has introduced a groundbreaking production-oriented pulsed laser deposition (PLD) tool, a significant advancement in the realm of microelectromechanical systems (MEMS). This pioneering technology, known as Pulsus PLD system, facilitates the creation of aluminum scandium nitride (AlScN) films with the highest scandium content available. These films are poised to revolutionize the landscape of MEMS-based microphones and radio frequency (RF) filters, offering unparalleled performance and functionality.

The deployment of Pulsus PLD marks a milestone for Lam Research, expanding its portfolio of deposition, etch, and single-wafer clean products tailored for specialty technologies. Chris Carter, Lam Research’s Group Vice President and General Manager of the Customer Support Business Group, highlighted the strategic collaboration with CEA-Leti and Lam’s expertise in specialty semiconductor technologies, emphasizing the potential of this breakthrough solution to drive advancements in the specialty market.

At the heart of Pulsus PLD lies its ability to deposit high-quality films crucial for optimizing RF filters and MEMS microphones. These films, composed of at least 40% scandium the highest concentration available to date exhibit low dielectric loss and enhanced piezoelectric qualities. Notably, the technology enables the replacement of lead zirconate titanate (PZT) with lead-free AlScN, further advancing device performance while meeting environmental standards.

The PLD process employed by Pulsus utilizes an intense laser pulse to vaporize target material, creating a stable plasma plume deposited onto a wafer in thin layers. This precise process ensures uniform film deposition with meticulous control over thickness and stress, crucial for high-volume manufacturing.

Pulsus™ PLD represents a significant leap forward in thin film deposition technology, leveraging lasers for enhanced performance and efficiency in specialty device manufacturing.

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